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RESEARCH GROUP


DR. KIM, Seong-Keun

Smart Electronic Materials Lab

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번호 게재년월 구분 제목 파일
1 2014-12 국제 논문지 Target-specific near-IR induced drug release and photothermal therapy with accumulated Au/Ag hollow nanoshells on pulmonary cancer cell membranes
2 2014-11 국제 논문지 Enhancement of Initial Growth of ZnO Films on Layer-Structured Bi2Te3 by Atomic Layer Deposition
3 2014-11 국제 논문지 Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes
4 2014-11 국제 논문지 Giant electrode effect on tunnelling electroresistance in ferroelectric tunnel junctions
5 2014-11 국제 논문지 Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-Doped TiO2 Film
6 2014-11 국제 논문지 Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O
7 2014-11 국제 논문지 SnO2 thin films grown by atomic layer deposition using a novel Sn precursor
8 2014-10 국제 논문지 Multiprotocol-induced plasticity in artificial synapses
9 2014-10 국제 논문지 Chemistry of Active Oxygen in RuOx and Its Influence on the Atomic Layer Deposition of TiO2 Films
10 2014-10 국제 논문지 Conformational structures of 3-cyanoindole-(H2O)n (n = 0–2) by UV–UV hole-burning and IR-dip spectroscopy
11 2014-10 국제 논문지 Fabrication and surface plasmon coupling studies on the dielectric/Ag structure for transparent conducting electrode applications
12 2014-09 국제 논문지 Nonvolatile Resistance Switching on Two-Dimensional Electron Gas
13 2014-08 국제 논문지 Flexibility of single-stranded DNA measured by single-molecule FRET
14 2014-06 국제 논문지 Thermopower Enhancement of Bi2Te3 Films by Doping I Ions
15 2014-05 국제 논문지 Atomic layer deposition of HfO2 thin films using H2O2 as oxidant
16 2014-05 국제 논문지 Dynamic temperature response of electrocaloric multilayer capacitors
17 2014-04 국제 논문지 Impact of parasitic thermal effects on thermoelectric property measurements by Harman method
18 2014-04 국제 논문지 Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films
19 2014-04 국제 논문지 Oxygen-Vacancy-Induced Polar Behavior in (LaFeO3)(2)/(SrFeO3) Superlattices
20 2014-02 국제 논문지 Chemical structures and electrical properties of atomic layer deposited HfO2 thin films grown at an extremely low temperature (<= 100 degrees C) using O-3 as an oxygen source
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